Showing results: 46 - 60 of 189 items found.
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Spectrum Control
Custom and semi-custom components and modules utilizing hybrid thick and thin film, chip and wire, and SMT processes with leading edge semiconductor technologies.
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Empyrean Range -
Malvern Panalytical Ltd
With the Empyrean, Malvern Panalytical has set the new standard in developing the ultimate X-ray platform for the analysis of powders, thin films, nanomaterials and solid objects.
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Hiden Analytical Ltd.
A UHV surface analysis system for thin film depth profilingMeasures the surface composition of the first few nanometers and/or micrometers depth of solid samples.
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Pulsed Electron Deposition -
Neocera, Inc.
Is a process in which a pulsed (80-100 ns) high power electron beam (~1000 A, 15 kV) penetrates approximately 1 μm into the target resulting in a rapid evaporation of target material. The non-equilibrium heating of the target facilitates stoichiometric ablation of the target material. Under optimum conditions, the target stoichiometry is preserved in the deposited films. All solid state materials – metals, semiconductors and insulators, including those transparent to laser wavelengths in PLD – can be deposited as thin films with PED. By combining PLD and PED, the range of complex materials that can be prepared as thin films can be greatly enhanced.
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alpha-SE® -
J.A. Woollam Co., Inc.
For routine measurements of thin film thickness and refractive index, this ellipsometer allows you to mount a sample, choose the model that matches your film, and press "measure". You have results within seconds. Works with your materials - dielectrics, semiconductors, organics, and more.
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NC-60F/RS-1300N -
NAPSON Corp.
*Global standard for non-contact measurement of ITO film, Metal thin films on flat panel*Automatic X-Y and Z (eddy current probe head) axis moving mechanism*Compatible with Loading robot for fully automatic measurementOption :*Integlate to combined system (film thickness meter, etc)*Add 4 point probe measurement unit : RT-3000
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FilmTek 2000M -
Scientific Computing International
Micro-spot size benchtop metrology system engineered for unparalleled versatility and high performance, meeting the needs of patterned film applications requiring a very small spot size. Allows for measurement spot sizes as small as 2µm, and delivers reliable measurement of both thin and thick films.
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Plasma Source -
SPECS Surface Nano Analysis GmbH
Thin-film deposition covers any technique for depositing material onto a bulk or thin film substrate. Elemental alloy or compound films are produced by non-reactive or reactive (co-)deposition. Often functionalization or tailoring of device interfaces by predeposition or deposition assisting surface treatment with atoms or ions is necessary.
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Veeco Instruments Inc
Physical Vapor Deposition Systems offer maximum flexibility for a wide range of thin film deposition applications with advanced process capabilities, unsurpassed uniformity and multiple deposition modes.
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RG-100PV -
NAPSON Corp.
*Measurement system for thin film on substrate samples for multi-points measurement*Even pitch and random pitch for Max.1,000 points*2-D/3-D square mapping software for even pitch
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FLATSCAN -
Optik Elektronik Gerätetechnik GmbH
Non contact automated 2D- or 3D measurement of warp, bow, slope and surface curvature with software module for calculation of thin film stress (wafer stress) of wafers and glass substrates.
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PH-SE -
HenergySolar
The spectroscopic ellipsometer is used for thin film and material characterization in R & D. The spectroscopic ellipsometer is designed to meet the requirements in modern research with special emphasis on speed and accuracy for an unmatched variety of applications.
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DUH-210/DUH-210S -
Shimadzu Corp.
A new evaluation system for measuring the material strength of micro regions, such as semiconductors, LSI, ceramics, hard disks, vapor deposited films, and thin coating layers, not addressed by previous hardness testers. It can also be used to evaluate the hardness of plastics and rubbers. This instrument uniquely measures dynamic indentation depth, not the indentation after the test. This in turn permits measurement of very thin films and surface (treatment) layers that are impossible to measure with conventional methods. Additionally, this same method supplies the data needed to calculate elastic modulus on the test specimens.
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MKS Instruments
MKS offers a wide range of ozone generators and modular delivery systems which produce ultra-pure, reliable ozone gas. In the clean semiconductor environment, Ozone reacts with a wide range of precursor gases resulting in the creation of Al2O3, ZrO2, HfO2, and La2O3 metal oxides to enable thin film deposition processes like Atomic Layer Deposition (ALD) and Etch (ALE). MKS’ generator uses Grade 6 gas, enabling the creation of higher film density improving product yield. Photovoltaic and Display manufacturing leverage semiconductor best practices and utilize ozone to create enhanced thin film barriers, improving product performance and reliability.
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FilmTek 2000 -
Scientific Computing International
Automated metrology system designed for rapid, reliable, and accurate characterization of nearly any unpatterned thin film. Fully user-customizable wafer mapping capabilities rapidly generate 2D and 3D data maps of any measured parameter. Capable of simultaneous determination of multiple film characteristics within a fraction of a second per site.